Handbook of Multilevel Metallization for Integrated Circuits

Handbook of Multilevel Metallization for Integrated Circuits

Author: Syd R. Wilson

Publisher: William Andrew Inc.

Published: 1993

Total Pages: 887

ISBN-13: 9780815513407

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Book Synopsis Handbook of Multilevel Metallization for Integrated Circuits by : Syd R. Wilson

Download or read book Handbook of Multilevel Metallization for Integrated Circuits written by Syd R. Wilson and published by William Andrew Inc.. This book was released on 1993 with total page 887 pages. Available in PDF, EPUB and Kindle. Book excerpt: .


Flat-Panel Display Technologies

Flat-Panel Display Technologies

Author: Lawrence Tannas Jr.

Publisher: Elsevier

Published: 1995-12-31

Total Pages: 592

ISBN-13: 081551722X

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Large scale manufacturing of liquid crystal flat panel displays (LCDs) by Japan brought the world's attention to the existence of an enormous market potential exists when there are alternatives to the cathode ray tube (CRT). The Japanese have recognized that new display technologies are critical to making their products highly competitive in the world market. The CRT is losing market share to the solid-state flat panel display. Japan currently holds 90% of the market, and this book outlines opportunities in the former Soviet Union, where companies with the necessary technology are seeking partners, investment, and manufacturing opportunities. Entire cities that were once not even on the map due to their military mission, are now appearing, filled with state-of-the-art electronic technology. The book is developed from the reports issued by investigators based on their field visits to 33 sites in Japan, and 26 sites in Russia, Ukraine, and Belarus.


Book Synopsis Flat-Panel Display Technologies by : Lawrence Tannas Jr.

Download or read book Flat-Panel Display Technologies written by Lawrence Tannas Jr. and published by Elsevier. This book was released on 1995-12-31 with total page 592 pages. Available in PDF, EPUB and Kindle. Book excerpt: Large scale manufacturing of liquid crystal flat panel displays (LCDs) by Japan brought the world's attention to the existence of an enormous market potential exists when there are alternatives to the cathode ray tube (CRT). The Japanese have recognized that new display technologies are critical to making their products highly competitive in the world market. The CRT is losing market share to the solid-state flat panel display. Japan currently holds 90% of the market, and this book outlines opportunities in the former Soviet Union, where companies with the necessary technology are seeking partners, investment, and manufacturing opportunities. Entire cities that were once not even on the map due to their military mission, are now appearing, filled with state-of-the-art electronic technology. The book is developed from the reports issued by investigators based on their field visits to 33 sites in Japan, and 26 sites in Russia, Ukraine, and Belarus.


Handbook of Thin Film Deposition

Handbook of Thin Film Deposition

Author: Krishna Seshan

Publisher: William Andrew

Published: 2012-06-27

Total Pages: 412

ISBN-13: 1437778739

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Resumen: The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.


Book Synopsis Handbook of Thin Film Deposition by : Krishna Seshan

Download or read book Handbook of Thin Film Deposition written by Krishna Seshan and published by William Andrew. This book was released on 2012-06-27 with total page 412 pages. Available in PDF, EPUB and Kindle. Book excerpt: Resumen: The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.


Handbook of Physical Vapor Deposition (PVD) Processing

Handbook of Physical Vapor Deposition (PVD) Processing

Author: D. M. Mattox

Publisher: Cambridge University Press

Published: 2014-09-19

Total Pages: 947

ISBN-13: 0080946585

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This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.


Book Synopsis Handbook of Physical Vapor Deposition (PVD) Processing by : D. M. Mattox

Download or read book Handbook of Physical Vapor Deposition (PVD) Processing written by D. M. Mattox and published by Cambridge University Press. This book was released on 2014-09-19 with total page 947 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.


The MSFC Complementary Metal Oxide Semiconductor (including Multilevel Interconnect Metallization) Process Handbook

The MSFC Complementary Metal Oxide Semiconductor (including Multilevel Interconnect Metallization) Process Handbook

Author:

Publisher:

Published: 1979

Total Pages: 76

ISBN-13:

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Book Synopsis The MSFC Complementary Metal Oxide Semiconductor (including Multilevel Interconnect Metallization) Process Handbook by :

Download or read book The MSFC Complementary Metal Oxide Semiconductor (including Multilevel Interconnect Metallization) Process Handbook written by and published by . This book was released on 1979 with total page 76 pages. Available in PDF, EPUB and Kindle. Book excerpt:


Handbook of Thin Film Deposition Processes and Techniques

Handbook of Thin Film Deposition Processes and Techniques

Author: Krishna Seshan

Publisher: William Andrew

Published: 2001-02-01

Total Pages: 430

ISBN-13: 0815517785

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New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.


Book Synopsis Handbook of Thin Film Deposition Processes and Techniques by : Krishna Seshan

Download or read book Handbook of Thin Film Deposition Processes and Techniques written by Krishna Seshan and published by William Andrew. This book was released on 2001-02-01 with total page 430 pages. Available in PDF, EPUB and Kindle. Book excerpt: New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.


Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon

Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon

Author: Krishna Seshan

Publisher: CRC Press

Published: 2002-02-01

Total Pages: 72

ISBN-13: 1482269686

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The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec


Book Synopsis Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon by : Krishna Seshan

Download or read book Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon written by Krishna Seshan and published by CRC Press. This book was released on 2002-02-01 with total page 72 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec


Adhesives Technology for Electronic Applications

Adhesives Technology for Electronic Applications

Author: James J. Licari

Publisher: Elsevier

Published: 2005-08-30

Total Pages: 477

ISBN-13: 0815516002

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This book is unique in its comprehensive coverage of all aspects of adhesive technology for microelectronic devices and packaging, from theory to bonding to test procedures. In addition to general applications, such as dies, substrate, and lid and chip stack attachments, the book includes new developments in anisotropic, electrically conductive, and underfill adhesives. Rapid curing methods such as UV, microwave, and moisture (which comply with current environmental and energy requirements) are covered. Over 80 tables and 120 figures provide a wealth of data on properties, performance, and reliability. Also included are examples of commercially available adhesives, suppliers, and equipment. Each chapter provides comprehensive references.


Book Synopsis Adhesives Technology for Electronic Applications by : James J. Licari

Download or read book Adhesives Technology for Electronic Applications written by James J. Licari and published by Elsevier. This book was released on 2005-08-30 with total page 477 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is unique in its comprehensive coverage of all aspects of adhesive technology for microelectronic devices and packaging, from theory to bonding to test procedures. In addition to general applications, such as dies, substrate, and lid and chip stack attachments, the book includes new developments in anisotropic, electrically conductive, and underfill adhesives. Rapid curing methods such as UV, microwave, and moisture (which comply with current environmental and energy requirements) are covered. Over 80 tables and 120 figures provide a wealth of data on properties, performance, and reliability. Also included are examples of commercially available adhesives, suppliers, and equipment. Each chapter provides comprehensive references.


Low Dielectric Constant Materials for IC Applications

Low Dielectric Constant Materials for IC Applications

Author: Paul S. Ho

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 323

ISBN-13: 3642559085

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Low dielectric constant materials are an important component of microelectronic devices. This comprehensive book covers the latest low-dielectric-constant (low-k) materials technology, thin film materials characterization, integration and reliability for back-end interconnects and packaging applications in microelectronics. Highly informative contributions from leading academic and industrial laboratories provide comprehensive information about materials technologies for


Book Synopsis Low Dielectric Constant Materials for IC Applications by : Paul S. Ho

Download or read book Low Dielectric Constant Materials for IC Applications written by Paul S. Ho and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 323 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low dielectric constant materials are an important component of microelectronic devices. This comprehensive book covers the latest low-dielectric-constant (low-k) materials technology, thin film materials characterization, integration and reliability for back-end interconnects and packaging applications in microelectronics. Highly informative contributions from leading academic and industrial laboratories provide comprehensive information about materials technologies for


Handbook of Hydrothermal Technology

Handbook of Hydrothermal Technology

Author: K. Byrappa

Publisher: Cambridge University Press

Published: 2008-12-10

Total Pages: 898

ISBN-13: 008094681X

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Quartz, zeolites, gemstones, perovskite type oxides, ferrite, carbon allotropes, complex coordinated compounds and many moreùall products now being produced using hydrothermal technology. Handbook of Hydrothermal Technology brings together the latest techniques in this rapidly advancing field in one exceptionally useful, long-needed volume. The handbook provides a single source for understanding how aqueous solvents or mineralizers work under temperature and pressure to dissolve and recrystallize normally insoluble materials, and decompose or recycle any waste material. The result, as the authors show in the book, is technologically the most efficient method in crystal growth, materials processing, and waste treatment. The book gives scientists and technologists an overview of the entire subject including: ò Evolution of the technology from geology to widespread industrial use. ò Descriptions of equipment used in the process and how it works. ò Problems involved with the growth of crystals, processing of technological materials, environmental and safety issues. ò Analysis of the direction of today's technology. In addition, readers get a close look at the hydrothermal synthesis of zeolites, fluorides, sulfides, tungstates, and molybdates, as well as native elements and simple oxides. Delving into the commercial production of various types, the authors clarify the effects of temperature, pressure, solvents, and various other chemical components on the hydrothermal processes.


Book Synopsis Handbook of Hydrothermal Technology by : K. Byrappa

Download or read book Handbook of Hydrothermal Technology written by K. Byrappa and published by Cambridge University Press. This book was released on 2008-12-10 with total page 898 pages. Available in PDF, EPUB and Kindle. Book excerpt: Quartz, zeolites, gemstones, perovskite type oxides, ferrite, carbon allotropes, complex coordinated compounds and many moreùall products now being produced using hydrothermal technology. Handbook of Hydrothermal Technology brings together the latest techniques in this rapidly advancing field in one exceptionally useful, long-needed volume. The handbook provides a single source for understanding how aqueous solvents or mineralizers work under temperature and pressure to dissolve and recrystallize normally insoluble materials, and decompose or recycle any waste material. The result, as the authors show in the book, is technologically the most efficient method in crystal growth, materials processing, and waste treatment. The book gives scientists and technologists an overview of the entire subject including: ò Evolution of the technology from geology to widespread industrial use. ò Descriptions of equipment used in the process and how it works. ò Problems involved with the growth of crystals, processing of technological materials, environmental and safety issues. ò Analysis of the direction of today's technology. In addition, readers get a close look at the hydrothermal synthesis of zeolites, fluorides, sulfides, tungstates, and molybdates, as well as native elements and simple oxides. Delving into the commercial production of various types, the authors clarify the effects of temperature, pressure, solvents, and various other chemical components on the hydrothermal processes.