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Book Synopsis Infrared Spectroscopic Ellipsometry by : Arnulf Röseler
Download or read book Infrared Spectroscopic Ellipsometry written by Arnulf Röseler and published by VCH. This book was released on 1990 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Design and Performance of an Infrared Spectroscopic Ellipsometer/reflectometer for Thin-film Characterization by : Michael Scott Thomas
Download or read book Design and Performance of an Infrared Spectroscopic Ellipsometer/reflectometer for Thin-film Characterization written by Michael Scott Thomas and published by . This book was released on 1996 with total page 188 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.
Book Synopsis Spectroscopic Ellipsometry by : Harland G. Tompkins
Download or read book Spectroscopic Ellipsometry written by Harland G. Tompkins and published by Momentum Press. This book was released on 2015-12-16 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.
Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.
Book Synopsis Spectroscopic Ellipsometry by : Hiroyuki Fujiwara
Download or read book Spectroscopic Ellipsometry written by Hiroyuki Fujiwara and published by John Wiley & Sons. This book was released on 2007-09-27 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.
Book Synopsis Far-infrared Spectroscopic Ellipsometry on AIII BV Semiconductor Heterostructures by : Tino Hofmann
Download or read book Far-infrared Spectroscopic Ellipsometry on AIII BV Semiconductor Heterostructures written by Tino Hofmann and published by . This book was released on 2004 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
The objective of this dissertation is to present opto-mechanical design of a synchrotron radiation based far-infrared spectroscopic ellipsometer with a strong external magnetic-field capability. Since high magnetic field has enabled major breakthrough in science such instrument will be highly important to the field of condensed matter physics and characterization of advanced electronic materials. This instrument will be installed at the multi-User facility with the most advanced synchrotron light source: Natonal Synchrotron Source (NSLS-II) at Brookhaven National Laboratory (BNL).The proposed here instrument is capable to measure full Mueller matrix spectroscopic ellipsometry spectra in high magnetic fields of up to 9 Tesla. The designed instrument consists of Polarization State Generator (PSG) chamber, Spectromag optical solenoid (high magnetic field up to 9 T), cryogenic sample stage, Polarization State Analyzer (PSA) chamber, and a bolometer. The PSG and PSA vacuum chambers are separated from the magnet volume with two pairs of gate valves equipped with optical windows. This instrument is capable of using synchrotron radiation in the spectral range of 20 cm-1 and 4000 cm-1. The sample stage could operate in the low temperature range down to 4 K with an option to cool sample down to 1.6 K. This instrument allows User to switch between Faraday and Voigt configurations for external magnetic field. This ellipsometer will be able to measure the full-Mueller matrix spectra using rotating retarders and rotating polarizers.
Book Synopsis Opto-mechanical Design of Synchrotron Radiation-based Far-infrared Spectroscopic Ellipsometer with Strong Magnetic-field by : Ahmad Abbas Chaudhry
Download or read book Opto-mechanical Design of Synchrotron Radiation-based Far-infrared Spectroscopic Ellipsometer with Strong Magnetic-field written by Ahmad Abbas Chaudhry and published by . This book was released on 2016 with total page 79 pages. Available in PDF, EPUB and Kindle. Book excerpt: The objective of this dissertation is to present opto-mechanical design of a synchrotron radiation based far-infrared spectroscopic ellipsometer with a strong external magnetic-field capability. Since high magnetic field has enabled major breakthrough in science such instrument will be highly important to the field of condensed matter physics and characterization of advanced electronic materials. This instrument will be installed at the multi-User facility with the most advanced synchrotron light source: Natonal Synchrotron Source (NSLS-II) at Brookhaven National Laboratory (BNL).The proposed here instrument is capable to measure full Mueller matrix spectroscopic ellipsometry spectra in high magnetic fields of up to 9 Tesla. The designed instrument consists of Polarization State Generator (PSG) chamber, Spectromag optical solenoid (high magnetic field up to 9 T), cryogenic sample stage, Polarization State Analyzer (PSA) chamber, and a bolometer. The PSG and PSA vacuum chambers are separated from the magnet volume with two pairs of gate valves equipped with optical windows. This instrument is capable of using synchrotron radiation in the spectral range of 20 cm-1 and 4000 cm-1. The sample stage could operate in the low temperature range down to 4 K with an option to cool sample down to 1.6 K. This instrument allows User to switch between Faraday and Voigt configurations for external magnetic field. This ellipsometer will be able to measure the full-Mueller matrix spectra using rotating retarders and rotating polarizers.
Book Synopsis Infrared Spectroscopic Ellipsometry for Ion-Implanted Silicon Wafers by : Xianming Liu
Download or read book Infrared Spectroscopic Ellipsometry for Ion-Implanted Silicon Wafers written by Xianming Liu and published by . This book was released on 2011 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
The study of semiconductor-layer structures using infrared ellipsometry is a rapidly growing field within optical spectroscopy. This book offers basic insights into the concepts of phonons, plasmons and polaritons, and the infrared dielectric function of semiconductors in layered structures. It describes how strain, composition, and the state of the atomic order within complex layer structures of multinary alloys can be determined from an infrared ellipsometry examination. Special emphasis is given to free-charge-carrier properties, and magneto-optical effects. A broad range of experimental examples are described, including multinary alloys of zincblende and wurtzite structure semiconductor materials, and future applications such as organic layer structures and highly correlated electron systems are proposed.
Book Synopsis Infrared Ellipsometry on Semiconductor Layer Structures by : Mathias Schubert
Download or read book Infrared Ellipsometry on Semiconductor Layer Structures written by Mathias Schubert and published by Springer Science & Business Media. This book was released on 2004-11-26 with total page 216 pages. Available in PDF, EPUB and Kindle. Book excerpt: The study of semiconductor-layer structures using infrared ellipsometry is a rapidly growing field within optical spectroscopy. This book offers basic insights into the concepts of phonons, plasmons and polaritons, and the infrared dielectric function of semiconductors in layered structures. It describes how strain, composition, and the state of the atomic order within complex layer structures of multinary alloys can be determined from an infrared ellipsometry examination. Special emphasis is given to free-charge-carrier properties, and magneto-optical effects. A broad range of experimental examples are described, including multinary alloys of zincblende and wurtzite structure semiconductor materials, and future applications such as organic layer structures and highly correlated electron systems are proposed.
A one-of-a-kind text offering an introduction to the use of spectroscopic ellipsometry for novel material characterization In Introduction to Spectroscopic Ellipsometry of Thin Film Materials: Instrumentation, Data Analysis and Applications, a team of eminent researchers delivers an incisive exploration of how the traditional experimental technique of spectroscopic ellipsometry is used to characterize the intrinsic properties of novel materials. The book focuses on the scientifically and technologically important two-dimensional transition metal dichalcogenides (2D-TMDs), magnetic oxides like manganite materials, and unconventional superconductors, including copper oxide systems. The distinguished authors discuss the characterization of properties, like electronic structures, interfacial properties, and the consequent quasiparticle dynamics in novel quantum materials. Along with illustrative and specific case studies on how spectroscopic ellipsometry is used to study the optical and quasiparticle properties of novel systems, the book includes: Thorough introductions to the basic principles of spectroscopic ellipsometry and strongly correlated systems, including copper oxides and manganites Comprehensive explorations of two-dimensional transition metal dichalcogenides Practical discussions of single layer graphene systems and nickelate systems In-depth examinations of potential future developments and applications of spectroscopic ellipsometry Perfect for master’s- and PhD-level students in physics and chemistry, Introduction to Spectroscopic Ellipsometry of Thin Film Materials will also earn a place in the libraries of those studying materials science seeking a one-stop reference for the applications of spectroscopic ellipsometry to novel developed materials.
Book Synopsis Introduction to Spectroscopic Ellipsometry of Thin Film Materials by : Andrew T. S. Wee
Download or read book Introduction to Spectroscopic Ellipsometry of Thin Film Materials written by Andrew T. S. Wee and published by John Wiley & Sons. This book was released on 2022-03-08 with total page 213 pages. Available in PDF, EPUB and Kindle. Book excerpt: A one-of-a-kind text offering an introduction to the use of spectroscopic ellipsometry for novel material characterization In Introduction to Spectroscopic Ellipsometry of Thin Film Materials: Instrumentation, Data Analysis and Applications, a team of eminent researchers delivers an incisive exploration of how the traditional experimental technique of spectroscopic ellipsometry is used to characterize the intrinsic properties of novel materials. The book focuses on the scientifically and technologically important two-dimensional transition metal dichalcogenides (2D-TMDs), magnetic oxides like manganite materials, and unconventional superconductors, including copper oxide systems. The distinguished authors discuss the characterization of properties, like electronic structures, interfacial properties, and the consequent quasiparticle dynamics in novel quantum materials. Along with illustrative and specific case studies on how spectroscopic ellipsometry is used to study the optical and quasiparticle properties of novel systems, the book includes: Thorough introductions to the basic principles of spectroscopic ellipsometry and strongly correlated systems, including copper oxides and manganites Comprehensive explorations of two-dimensional transition metal dichalcogenides Practical discussions of single layer graphene systems and nickelate systems In-depth examinations of potential future developments and applications of spectroscopic ellipsometry Perfect for master’s- and PhD-level students in physics and chemistry, Introduction to Spectroscopic Ellipsometry of Thin Film Materials will also earn a place in the libraries of those studying materials science seeking a one-stop reference for the applications of spectroscopic ellipsometry to novel developed materials.
This book presents and introduces ellipsometry in nanoscience and nanotechnology making a bridge between the classical and nanoscale optical behaviour of materials. It delineates the role of the non-destructive and non-invasive optical diagnostics of ellipsometry in improving science and technology of nanomaterials and related processes by illustrating its exploitation, ranging from fundamental studies of the physics and chemistry of nanostructures to the ultimate goal of turnkey manufacturing control. This book is written for a broad readership: materials scientists, researchers, engineers, as well as students and nanotechnology operators who want to deepen their knowledge about both basics and applications of ellipsometry to nanoscale phenomena. It starts as a general introduction for people curious to enter the fields of ellipsometry and polarimetry applied to nanomaterials and progresses to articles by experts on specific fields that span from plasmonics, optics, to semiconductors and flexible electronics. The core belief reflected in this book is that ellipsometry applied at the nanoscale offers new ways of addressing many current needs. The book also explores forward-looking potential applications.
Book Synopsis Ellipsometry at the Nanoscale by : Maria Losurdo
Download or read book Ellipsometry at the Nanoscale written by Maria Losurdo and published by Springer Science & Business Media. This book was released on 2013-03-12 with total page 740 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents and introduces ellipsometry in nanoscience and nanotechnology making a bridge between the classical and nanoscale optical behaviour of materials. It delineates the role of the non-destructive and non-invasive optical diagnostics of ellipsometry in improving science and technology of nanomaterials and related processes by illustrating its exploitation, ranging from fundamental studies of the physics and chemistry of nanostructures to the ultimate goal of turnkey manufacturing control. This book is written for a broad readership: materials scientists, researchers, engineers, as well as students and nanotechnology operators who want to deepen their knowledge about both basics and applications of ellipsometry to nanoscale phenomena. It starts as a general introduction for people curious to enter the fields of ellipsometry and polarimetry applied to nanomaterials and progresses to articles by experts on specific fields that span from plasmonics, optics, to semiconductors and flexible electronics. The core belief reflected in this book is that ellipsometry applied at the nanoscale offers new ways of addressing many current needs. The book also explores forward-looking potential applications.